JSP Inquiry Categories: Magnetron Sputtering Systems Categories Menu Deposition System Thermo Evaporator E-Beam Evaporator Quantum Computing Deposition System Magnetron Sputtering Systems Molecular Beam Epitaxy (MBE) Pulsed Laser Deposition (PLD) Ion-Beam Sputter Deposition _IBSD Linear and cluster system Plasma System Reactive-Ion Etching ( RIE ) Inductively Coupled Plasma ( ICP ) Electron Cyclotron Resonance ( ECR ) Ion Beam Etching Uhv Design & Components Laser Heating JSP Feature (General Application) Base pressure: 5E-9 torr Co Sputter system 4 Sputter Cathodes Sus coil Heater 600 degree 4 Sputter Cathodes SiC Heater 800 degree C Single Sputter for Al deposition LN2 Cooling substrate 360 degree Rotation Full Auto transfer and operation
