What Is Ald And Peald? UHV Plasma Enhanced Atomic Layer Deposition (PEALD) Introductory Principle： Plasma Enhanced Atomic Layer Deposition (PEALD) is a deposition technique used for producing high quality epitaxial (atomic layer) thin film. PEALD use chemical precursors in which each precursors are carefully selected and introduced in specific order. During the deposition process, the […]
What Is Ald And Peald? Read more »
What Is Ibsd And Ibe? UHV Ion-Beam Sputter Deposition (IBSD) Introductory Principle： Ion-Beam Sputter Deposition (IBSD) is a thin-layer deposition method in which the mechanism of ion production is separate from the target. The ion source generate ions from a hot filament by collisions with electrons that are confined by a magnetic field. The ions
What Is Ibsd And Ibe? Read more »
What Is Pulsed Laser Deposition? UHV Pulsed Laser Deposition – Laser MBE (PLD) Introductory Principle： In Pulsed-Laser Deposition (PLD) or Laser MBE, high power pulsed laser beam is focused on the surface of the target. When the laser pulse is absorbed by the target, energy is converted to electronic excitation and then into thermal, chemical
What Is Pulsed Laser Deposition? Read more »
What is MBE Technology ? UHV Molecular Beam Epitaxy (MBE) Introductory Principle： Molecular Beam Epitaxy (MBE) is an ultrahigh vacuum (UHV) deposition technique used for producing high quality epitaxial (atomic layer) thin film with precise control on thickness, composition and morphology. This allows Laser MBE technique to produce much higher thin layer quality compared to
What is MBE Technology? Read more »