Substrate Manipulator & Sic Heater
- Single holder: from 10x10 mm2 to 8-in
- Substrate backplate
- Planetary Substrate Manipulator
Main Specifications：
- 2"~4" (larger elements upon request) mm diameter heater element
- 360 degree rotation or ± 180 degree (optional)
- Heating up to 1000 ºC (Oxygen compatible)
- Cooling system: cooling fan or water cooling
- Real time monitor and control substrate temperature during rotation
- State-of-the-art and easy operation computer software control
- Z-translation
- XYZ- translation
- Substrate Rotation
- Substrate tilting
- Manipulator Rotation
Making a high temperature heater which can work in oxygen-rich atmospheres is not easy.
Many heating materials and mechanisms are not suitable for UHV conditions due to their high vapor pressure. Fortunately, there are some ways to overcome this problem, such as Platinum heating element, SiC heating element with well-designed shape, etc. But each methods has their own issues, such as high maintenance frequency, short life time, etc.
- Ultra-pure 99.9995%
- SiC heater fabricated from CVD material
- Unparalleled wear and corrosion resistance
- Uniform resistivity of 0.010 ohm/cm
- Thermal shock resistant
- Low outgassing rate
- High thermal conductivity
- Low CTE
- Complex geometry possible
- Theoretically dense
- Low contact resistance to electrodes
- Thermocouple
- Pyrometer
- Pneumatic shutter
- Shower Gas Head
- Substrate Bias
- CCD Camera
Making a high temperature heater which can work in oxygen-rich atmospheres is not easy.
Many heating materials and mechanisms are not suitable for UHV conditions due to their high vapor pressure. Fortunately, there are some ways to overcome this problem, such as Platinum heating element, SiC heating element with well-designed shape, etc. But each methods has their own issues, such as high maintenance frequency, short life time, etc.
- Ultra-pure 99.9995%
- SiC heater fabricated from CVD material
- Unparalleled wear and corrosion resistance
- Uniform resistivity of 0.010 ohm/cm
- Thermal shock resistant
- Low outgassing rate
- High thermal conductivity
- Low CTE
- Complex geometry possible
- Theoretically dense
- Low contact resistance to electrodes