ECR RIE Inquiry Categories: Reactive-Ion Etching Categories Menu Deposition System Thermo Evaporator E-Beam Evaporator Quantum Computing Deposition System Magnetron Sputtering Systems Molecular Beam Epitaxy (MBE) Pulsed Laser Deposition (PLD) Ion-Beam Sputter Deposition _IBSD Linear and cluster system Plasma System Reactive-Ion Etching ( RIE ) Inductively Coupled Plasma ( ICP ) Electron Cyclotron Resonance ( ECR ) Ion Beam Etching Uhv Design & Components Laser Heating ECR RIE Include High Density Plasma Base Pressure：5E-7 torr Working Pressure：E-4 torr Top：Microwave power 800W Bottom：RF or DC Sample size：4 inch
