Include
- Wafer size – 2 inch
- Base pressure (1E-10) torr
- Manipulator could be tilted during
- Wafer size – 2 inch
- 9 ports for effusion cells (4.5”)
- 4 axis substrate manipulator with rotation and XYZmovement
- Load lock with substrate holder outgassing unit
- Resistive or laser substrate heater
- XYZ manipulator
- RHEED pattern registration system
- Fully automatic process control
- PBN Heater
- Cryo Pump
- Turbo Pump