Industrial Sputter Inquiry Categories: Magnetron Sputtering Systems Categories Menu Deposition System Thermo Evaporator E-Beam Evaporator Quantum Computing Deposition System Magnetron Sputtering Systems Molecular Beam Epitaxy (MBE) Pulsed Laser Deposition (PLD) Ion-Beam Sputter Deposition _IBSD Linear and cluster system Plasma System Reactive-Ion Etching ( RIE ) Inductively Coupled Plasma ( ICP ) Electron Cyclotron Resonance ( ECR ) Ion Beam Etching Uhv Design & Components Laser Heating Industrial Sputter Feature（Magnetic Application） Base pressure : 5E-7 torr 3 Sputter Cathodes 1 Plasma source Manipulator Water cooling Heating position Pumping throughput control
