Barrel Etchers Inquiry Categories: Ion Thrust and Ion source Categories Menu Deposition System Thermo Evaporator E-Beam Evaporator Quantum Computing Deposition System Magnetron Sputtering Systems Molecular Beam Epitaxy (MBE) Pulsed Laser Deposition (PLD) Ion-Beam Sputter Deposition _IBSD Linear and cluster system Plasma System Reactive-Ion Etching ( RIE ) Inductively Coupled Plasma ( ICP ) Electron Cyclotron Resonance ( ECR ) Ion Beam Etching UHV System & Components Laser Heating Barrel Etchers Include Chemical etching only, like pure wet etch Use plasma shield to keep ion bombardment from wafers, thus very little damage Poor uniformity Used in non-critical steps such as photoresist removal by O2 plasma (Barrel “asher” Polymer + O CO2 + H2O)
