Ion Thrust and Ion source It Work In High Vacuum And Low Vacuum (Can Work With Gas Or Not) The Most Compact Ion Source In The World Categories Menu Deposition System Thermo Evaporator E-Beam Evaporator Quantum Computing Deposition System Magnetron Sputtering Systems Molecular Beam Epitaxy (MBE) Pulsed Laser Deposition (PLD) Ion-Beam Sputter Deposition _IBSD Linear and cluster system Plasma System Reactive-Ion Etching ( RIE ) Inductively Coupled Plasma ( ICP ) Electron Cyclotron Resonance ( ECR ) Ion Beam Etching Uhv Design & Components Laser Heating Barrel EtchersIon Thrust and Ion source Our Paper Modes Of RIE CCP RIE (Plasma mode) 4 inch Wafer Etching Water cooling LN2 optional Cooling RF Plasma from Top by CCP Better Uniformity than RIE Smaller Etching rate ECR Ion Source (Still improving), Beam Spot size is 15mm
