UHV Twin Sputter Sputter - 12 Inquiry Categories: Magnetron Sputtering Systems Categories Menu Deposition System Thermo Evaporator E-Beam Evaporator Quantum Computing Deposition System Magnetron Sputtering Systems Molecular Beam Epitaxy (MBE) Pulsed Laser Deposition (PLD) Ion-Beam Sputter Deposition _IBSD Linear and cluster system Plasma System Reactive-Ion Etching ( RIE ) Inductively Coupled Plasma ( ICP ) Electron Cyclotron Resonance ( ECR ) Ion Beam Etching Uhv Design & Components Laser Heating UHV Twin Sputter Sputter-12 Feature（General Application） Base pressure: 5E-9 torr Co Sputter system 4 Sputter Cathodes 4 axis substrate Sus coil Heater 600 degree
