Include
- Wafer size – 4 inch
- Base pressure (1E-10) torr
- 10 ports for effusion cells (4.5”)
- 4 axis substrate manipulator with rotation and XYZmovement
- Load lock with substrate holder outgassing unit
- Resistive or laser substrate heater
- XYZ manipulator
- RHEED pattern registration system
- Additional port for e-beam gun
- Fully automatic process control
- PBN Heater
- Cryo Pump
- Turbo Pump