This equipment is a standard left-right load lock chamber, deposition chamber for Josephson junction or other application, it has an E-beam source in deposition chamber, Load lock.
Include
- Wafer size – up to 8 in
- Base pressure 10-8 torr
- Manipulator could be tilted during rotation by ±75 degrees
- 3 pockets capacity E-beam gun
- Ion beam assisted deposition (opt.)
- Dedicated FBBEAR software integrates an easy access to growth parameters, recipe editing, data logging and substrate transfer control
Feature : Standard Application
- Base pressure : 5E-8 torr
- 8 inch sample (Max)
- Tilt/rotation Substrate Manipulator with Z stage
- IBAD (option)
- Fully automatic software control
- Water cooling chamber
