JEB - 4 Inquiry Categories: Quantum Computering Categories Menu Deposition System Thermo Evaporator E-Beam Evaporator Quantum Computing Deposition System Magnetron Sputtering Systems Molecular Beam Epitaxy (MBE) Pulsed Laser Deposition (PLD) Ion-Beam Sputter Deposition _IBSD Linear and cluster system Plasma System Reactive-Ion Etching ( RIE ) Inductively Coupled Plasma ( ICP ) Electron Cyclotron Resonance ( ECR ) Ion Beam Etching Uhv Design & Components Laser Heating JEB-4 JEB-4 is a 4 chamber system, a stand alone Load Lock, ion beam chamber, E-beam chamber deposit high quality thin film. All chambers include UHV compatible baking lamp for system bake out, sample degassing. JEB-4 MBE This Type JEB-4 is capible to use Effusion cell as MBE evaporation and E-beam both. With Laser heating and SiC heater
